OPERATING INSTRUCTIONS |

GENERAL INFORMATION
This system consists of two 2” magnetron sputtering guns, 300W RF generator, auto matching network and a pulsed DC power supply. Substrates of up to 4” in size can be coated. They system is pumped down with a turbo pump and contains a load lock and is dedicated to dielectric film sputtering. Reactive sputtering with nitrogen or oxygen is available as well.

Materials available: Al3Nx, ZnO, SiOx, TiN, Al2O3. Other materials may be possible upon request.
Process gases: Ar, Oxygen/Nitrogen.

CONTACT INFORMATION
For additional information about the AJA Dielectric sputtering System, please contact the clean room staff at: cniCR@columbia.edu.

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